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Current Research Trends and the Need for Localization in Ultrapure Water Production Facilities in Semiconductor Industries

Boungsu Kwon, Sangho Lee, Seoktae Kang, Jaelim Lim

J Korean Soc Environ Eng. 2020;42(10):493-512. Published online 2020 October 31 DOI: https://doi.org/10.4491/KSEE.2020.42.10.493

Ultrapure Water Production

Sulakshana Deshmukh

Handbook of Water and Used Water Purification. 2020;1-22

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Ultrapure water for semiconductor facility

Membrane Technology. 1993;1993(44):4

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Effect of dissolved oxygen on efficiency of TOC reduction by UV at 185 nm in an ultrapure water production system

Jeongyun Choi, Jinwook Chung

Water Research. 2019;154:21-27

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Evaluation of urea removal by persulfate with UV irradiation in an ultrapure water production system

Jeongyun Choi, Jinwook Chung

Water Research. 2019;158:411-416

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EDI module for ultrapure water production

Filtration & Separation. 2004;41(5):12

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Ozone Decomposition in Ultrapure Water and Continuous Ozone Sterilization for a Semiconductor Ultrapure Water System

T. Ohmi, T. Isagawa, T. Imaoka, I. Sugiyama

Journal of The Electrochemical Society. 1992;139(11):3336-3345

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New Method to Generate the High Concentration Ozonated Water by Using the Ultrapure Water of the Semiconductor Factory

Makoto Miyamoto, Izumi Oya, Seiji Noda, Masaki Kuzumoto

Solid State Phenomena. 2001;76-77:219-222

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Production of ultrapure water for the STN-LCD process line

G. Zhang, J. Shong

Desalination. 1998;119(1-3):355-356

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State of the art ultrapure water production in Japan

H. Ohya

Desalination. 1991;80(2-3):159-165

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Energy-efficient production system for ultrapure water targeted

Focus on Catalysts. 2008;2008(7):6

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