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Current Research Trends and the Need for Localization in Ultrapure Water Production Facilities in Semiconductor Industries
Boungsu Kwon, Sangho Lee, Seoktae Kang, Jaelim Lim
J Korean Soc Environ Eng. 2020;42(10):493-512.   Published online 2020 October 31    DOI:

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Ultrapure Water Production
Handbook of Water and Used Water Purification. 2020;1-22   Crossref logo

Ultrapure water for semiconductor facility
Membrane Technology. 1993;1993(44):4   Crossref logo
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Effect of dissolved oxygen on efficiency of TOC reduction by UV at 185 nm in an ultrapure water production system
Water Research. 2019;154:21-27   Crossref logo
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Evaluation of urea removal by persulfate with UV irradiation in an ultrapure water production system
Water Research. 2019;158:411-416   Crossref logo
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EDI module for ultrapure water production
Filtration & Separation. 2004;41(5):12   Crossref logo
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Ozone Decomposition in Ultrapure Water and Continuous Ozone Sterilization for a Semiconductor Ultrapure Water System
Journal of The Electrochemical Society. 1992;139(11):3336-3345   Crossref logo
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New Method to Generate the High Concentration Ozonated Water by Using the Ultrapure Water of the Semiconductor Factory
Solid State Phenomena. 2001;76-77:219-222   Crossref logo

Production of ultrapure water for the STN-LCD process line
Desalination. 1998;119(1-3):355-356   Crossref logo
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State of the art ultrapure water production in Japan
Desalination. 1991;80(2-3):159-165   Crossref logo
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Energy-efficient production system for ultrapure water targeted
Focus on Catalysts. 2008;2008(7):6   Crossref logo
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